Rajiv О. Dusane (India)
Professor, Head of Department of Metallurgical Engineering & Materials Science, Institute of Technology Bombay, India.
Member of the Materials Research Society of India (MRSI).
Member of the Indian Institute of Metals (IIM).
Honorary Secretary of IIM, Mumbai branch (1999-2001).
Rajiv’s interests lie in the field of basic and applied research in the technology of semiconductor thin films and equipment and their applications. He is also involved in the development of the hot wire chemical vapor deposition (HWCVD) technique used in the wire industry.
Professor Dusane was a member of the International Advisory Panel of the 3rd International Conference on the HWCVD Process, which was held in Utrecht, Netherlands, in 2004. He was also invited to be a member of the International Program Committee of the 21st International Conference on Amorphous and Nanocrystalline Semiconductor Materials, which was held in Lisbon, Portugal, in 2005.
Research areas: Metallurgy.
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