Abstract
The effect of the gas mixture pressure on the phase composition, surface morphology, structural characteristics and physicomechanical properties of films on the Ti-Al-N basis, deposited by pulsed magnetron sputtering has been investigated. Polycrystalline film with a unique set of physical and mechanical properties has been obtained under the optimum pressure of the gas mixture.
Keywords
Pulsed magnetron sputtering, gas mix pressure, phase structure, a microstructure, physicomechanical properties.
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